摘要 |
Anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compound and at least one material modification agent, such as at least one porogen, at least one high-boiling solvent, at least one capping agent, at least one leveling agent, at least one catalyst, at least one replacement solvent, at least one pH tuning agent, and/or a combination thereof that are incorporated into inorganic-based materials or inorganic compositions and/or compounds. Suitable absorbing compounds are those that absorb around wavelengths such as 365 nm, 248 nm, 193 nm and 157 nm that may be used in photolithography.
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申请人 |
HONEYWELL INTERNATIONAL INC.;BALDWIN, TERESA;KENNEDY, JOSEPH;IWAMOTO, NANCY;NAKANO, TADASHI;BEDWELL, WILLIAM;STUCK, JASON;HEBERT, MELLO;SUEDMEYER, ARLENE |
发明人 |
BALDWIN, TERESA;KENNEDY, JOSEPH;IWAMOTO, NANCY;NAKANO, TADASHI;BEDWELL, WILLIAM;STUCK, JASON;HEBERT, MELLO;SUEDMEYER, ARLENE |