发明名称 PROTON NEUTRALIZER AND RESIST COMPOSITION COMPRISING THE SAME NEUTRALIZER
摘要 <P>PROBLEM TO BE SOLVED: To provide a proton neutralizer reactive with protons under relatively mild conditions such as storage of a resist material and efficiently preventing a dark reaction and having moderate reactivity without inhibiting a reaction of the protons with a base polymer during exposure and to provide a resist composition comprising the neutralizer. <P>SOLUTION: The proton neutralizer comprises a compound having two or more N-(<SP>t</SP>BOC) bonds in the molecule. The compound preferably has two or more nitrogen atoms in the molecule. The resist composition comprises the proton neutralizer. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004002225(A) 申请公布日期 2004.01.08
申请号 JP20020159636 申请日期 2002.05.31
申请人 EIWEISS KK 发明人 KUZUHA NOBORU
分类号 G03F7/004;C07C271/20;C07C281/02;G03F7/038;G03F7/039;H01L21/027 主分类号 G03F7/004
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