ETCHANT AND ETCHING METHOD

摘要

PROBLEM TO BE SOLVED: To form a laminated film having a second layer comprising aluminum or an aluminum alloy which contains at least one element selected from N, O, Si and C formed on a first layer comprising aluminum or an aluminum alloy through a single etching process wherein both films composing the laminated film are simultaneously formed with high precision, thus forming a fine wiring pattern while preventing the undercut of the upper layer film. SOLUTION: An etchant has a phosphoric acid content of 35-65 wt.% and a nitric acid content of 0.5-15 wt.%. and is used in the etching process. COPYRIGHT: (C)2004,JPO