| 摘要 |
<P>PROBLEM TO BE SOLVED: To reduce damage to a color filter due to heating during vapor deposition of or sputtering of transparent conductive film and damage at patterning time, by improving the heat resistance and the chemical resistance of a color filter or the like. <P>SOLUTION: The color filter and black matrix are replaced from conventional gelatin colored into each color with insulation film added with a pigment. The insulation film is formed of photosensitive polyimide film. The color filter or the like is formed at a substrate on the side of a thin film transistor in an active matrix type panel. Thus, the margin of the accuracy of bonding the substrate on the side of the thin film transistor and a counter substrate is mitigated. In addition, the need of an etching process when forming a pattern is eliminated, so that the reduction of cost is realized. Also, the color filter or the like is formed at the lower part of a picture element electrode. Thus, voltage is not applied to the color filter when driving liquid crystal. <P>COPYRIGHT: (C)2004,JPO |
