| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition which excels in the balance of various performances, such as resolution, profiles and depth of focus. <P>SOLUTION: The positive resist composition contains a quinonediazido photosensitive agent including at least one quinonediazido sulfonate of a phenolic compound like a formula (5) and an alkaline soluble resin. <P>COPYRIGHT: (C)2004,JPO |
