SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD, HIGH-SPEED ROTARY VALVE, AND CLEANING METHOD

摘要

PROBLEM TO BE SOLVED: To provide an ALD deposition device capable of improving purge efficiency and being operated by high throughput. SOLUTION: A substrate processing apparatus is provided with a substrate holding base for holding a substrate to be processed, a processing container to be exhausted at an exhaust port, and a raw material gas supply system for alternately supplying first and second raw material gases to the processing container in the form of laminar. The exhaust port is formed in a slit shape extended in a direction roughly orthogonal to the direction that the laminar flows, a valve provided with a valve body having a slit-like opening corresponding to the slit shape of the exhaust port is engaged with the exhaust port, and the slit-like opening of the valve body is formed so as to be displaced in the direction orthogonal to the extending direction of the exhaust port. COPYRIGHT: (C)2004,JPO