| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing equipment of a small footprint which allows a surface treatment with ozone and that with a process liquid. SOLUTION: The pure water stored in a process tank 10 provided in a chamber 5 is heated with a halogen lamp 80 to generate a water vapor, while an ozone gas is supplied from a gas nozzle 40 for peeling a resist on the surface of a substrate W. Since a chemical liquid such as a hydrofluoric acid as well as the pure water can be supplied to the process tank 10, the substrate W can be washed in pure water and treated in the chemical liquid within a single chamber 5. Since an IPA water vapor can be supplied in the chamber 5 or the chamber 5 can be decompressed, ozone treatment, surface treatment with a process liquid, and a dry process are carried out in a single chamber 5, resulting in a smaller footprint of the substrate processing equipment 1. COPYRIGHT: (C)2004,JPO
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