ETCHING METHOD AND ETCHING LIQUID

摘要

PROBLEM TO BE SOLVED: To stably carry out a uniform a wet-etching for a silver or silver alloy thin film layer by suppressing the occurrence of etch residual dross in a silver or silver alloy and suppressing the occurrence of side etching caused by over etching. SOLUTION: In the etching method where a silver or silver alloy thin film present on the surface of a substrate is subjected to etching with an etching liquid, the etching liquid in which the concentration of silver ions is 0.005 to 1 wt.% is filled into an etching liquid feeding apparatus, and the etching liquid is brought into contact with the surface of the substrate having the silver or silver alloy thin film layer. COPYRIGHT: (C)2004,JPO