| 摘要 |
PROBLEM TO BE SOLVED: To provide a small and rotary-type chemical vapor deposition apparatus for mass production which offers high production efficiency and can be operated with a small number of high-frequency power supplies, wherein a film-forming chamber performs a single production cycle while a rotating support rotates once, and a film-forming process. SOLUTION: The apparatus is equipped with the rotating support wherein two or more film-forming chambers housing vessels are arranged in a circle, a raw material gas introducing means for introducing raw material gas into each vessel and a high-frequency supplying means for supplying a high frequency wave to each external electrode. The apparatus deposits a chemical vapor deposition film on the inner surface of each vessel while rotating the rotating support once. The high-frequency feeding means is equipped with a fixed matching unit established for each external electrode, at least one high-frequency power supply, an automatic matching unit established for each high-frequency power supply, a high-frequency distributing means which equally supplies the predetermined film-forming chambers with high frequency waves supplied by the automatic matching unit via the fixed matching unit and a high-frequency power supply output control means for controlling the output of the predetermined high-frequency power supply. COPYRIGHT: (C)2004,JPO
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