| 摘要 |
PROBLEM TO BE SOLVED: To provide a coating liquid which is used for forming porous silica films and can form the porous silica films maintaining low dielectric constants and simultaneously scarcely deteriorating voltage resistance. SOLUTION: This coating liquid for forming the porous silica films comprises a resin obtained by condensing at least one of silane compounds represented by formula (1): Q<SP>1</SP><SB>a</SB>-Si-(OR<SP>1</SP>)<SB>4-a</SB>(1) [Q<SP>1</SP>is H, F, a 1 to 6C alkyl or an aryl which may be substituted; R<SP>1</SP>groups are the same or different, and are each a 1 to 6C alkyl, phenyl or R<SP>2</SP>CO; R<SP>2</SP>is H, a 1 to 6C alkyl or phenyl; (a) is an integer of 0 to 2], an amphoteric surfactant and an organic solvent. COPYRIGHT: (C)2004,JPO
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