| 摘要 |
An exposure apparatus for exposing a photoresist film formed on a semiconductor substrate includes a plurality of reticle stages on which respective reticles can be supported at the same time. The reticles can be selectively and hence, successively, positioned along the optical axis of the apparatus that extends from the light source of the apparatus to a substrate stage. One region of the photoresist film is exposed to light directed through the first reticle. Then the second reticle stage is aligned and another region of the photoresist film is exposed to light directed through the second reticle.
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