发明名称 X-RAY SPECTROSCOPIC EVALUATION METHOD AND MANUFACTURE OF SEMICONDUCTOR DEVICE
摘要 <p><P>PROBLEM TO BE SOLVED: To facilitate a so-called application to online evaluation by dispensing with enlarging a work area for a test piece nor separating an evaluated part from the test piece even if a high-precision X-ray spectroscopic evaluation is performed with a high spatial resolution is kept. <P>SOLUTION: In an X-ray spectroscopic evaluation method, a test piece is irradiated with electron beam for X-ray spectroscopic evaluation. There are provided a removing work step in which at least a part of an electron scattering region adjacent to the evaluated part of the test piece is hollowed into a concave shape, an embedding work step in which a part of or the entire hollow part 12 formed in the removing work step is covered with a material 13 of an element different from that constituting the evaluated part, and an evaluation step in which the evaluated part after the embedding work step is irradiated with electron beam for X-ray spectroscopic evaluation. <P>COPYRIGHT: (C)2004,JPO</p>
申请公布号 JP2004006545(A) 申请公布日期 2004.01.08
申请号 JP20020160917 申请日期 2002.06.03
申请人 SONY CORP 发明人 KAWASUMI TAKAYUKI
分类号 G01N23/225;H01J37/20;H01L21/66;(IPC1-7):H01L21/66 主分类号 G01N23/225
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