发明名称 MANUFACTURING METHOD OF SILICON WAFER
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a grinding technique to smooth out fine irregularities on the side face of a silicon block in a short time, thus improving the crack yield of a silicon wafer. <P>SOLUTION: The technique solves the foregoing task by employing a silicon wafer manufacturing method comprising mechanically grinding and slicing the side face of a silicon block for manufacturing a silicon wafer. <P>COPYRIGHT: (C)2004,JPO</p>
申请公布号 JP2004006997(A) 申请公布日期 2004.01.08
申请号 JP20030311423 申请日期 2003.09.03
申请人 SHARP CORP 发明人 KAJIMOTO KIMIHIKO;WAKUTA JUNZO
分类号 H01L21/304;H01L31/04;(IPC1-7):H01L21/304 主分类号 H01L21/304
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