发明名称 |
MANUFACTURING METHOD OF SILICON WAFER |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a grinding technique to smooth out fine irregularities on the side face of a silicon block in a short time, thus improving the crack yield of a silicon wafer. <P>SOLUTION: The technique solves the foregoing task by employing a silicon wafer manufacturing method comprising mechanically grinding and slicing the side face of a silicon block for manufacturing a silicon wafer. <P>COPYRIGHT: (C)2004,JPO</p> |
申请公布号 |
JP2004006997(A) |
申请公布日期 |
2004.01.08 |
申请号 |
JP20030311423 |
申请日期 |
2003.09.03 |
申请人 |
SHARP CORP |
发明人 |
KAJIMOTO KIMIHIKO;WAKUTA JUNZO |
分类号 |
H01L21/304;H01L31/04;(IPC1-7):H01L21/304 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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