METHOD FOR MANUFACTURING RETICLE

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing a reticle for manufacturing device patterns by using positive resist in a manner as not to allow light shielding layers acting as the sources for generation of foreign substances to remain at the peripheries etc. of a substrate.

SOLUTION: The method for manufacturing the reticle has at least a device pattern forming step for applying the positive resist to the device pattern forming regions of the light shielding layers formed on the substrate and irradiating the positive acting resist with energy rays, then developing the resist to form the pattern like positive resist and an alignment pattern forming step for applying the negative resist to the alignment pattern forming regions of the light shielding layers and irradiating the negative resist with the energy rays, then developing the resist to form the pattern like negative resist.

COPYRIGHT: (C)2004,JPO