| 发明名称 |
POLISHING PARTICLE, METHOD FOR PREPARING THE SAME AND ABRASIVE |
| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To prepare a polishing particle having a core-shell structure capable of controlling polishing speed by adjusting thickness and/or density of its shell part. <P>SOLUTION: The polishing particle provides an abrasive having a core-shell structure wherein an average particle diameter (D) is in the range of 5-300 nm, the shell part is composed of silica having thickness (S<SB>T</SB>) in the range of 1-50 nm, has density in the range of 1.6-2.2 g/cc and Na content of≤10 ppm. <P>COPYRIGHT: (C)2004,JPO</p> |
| 申请公布号 |
JP2004002723(A) |
申请公布日期 |
2004.01.08 |
| 申请号 |
JP20030074839 |
申请日期 |
2003.03.19 |
| 申请人 |
CATALYSTS & CHEM IND CO LTD |
发明人 |
NISHIDA HIROYASU;WAKAMIYA YOSHINORI;KOMATSU MICHIO |
| 分类号 |
B24B37/00;B82Y10/00;B82Y30/00;B82Y99/00;C01B33/141;C09K3/14;H01L21/304;(IPC1-7):C09K3/14 |
主分类号 |
B24B37/00 |
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