| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a microstructure forming method for improving the controllability of etching in the case of fine-working using isotropic etching, and also, attaining uniform working even in a large-sized substrate. <P>SOLUTION: As for the microstructure forming method, a body to be etched on the surface of which a mask having prescribed openings is disposed, is etched through the openings by using etching liquid, so as to form recesses on the surface of the body to be etched, and insoluble matter is generated by the reaction of the material contained in the body to be etched and the etching liquid, and then, etching is stopped by the insoluble matter accumulated on the exposed surface of the body to be etched. <P>COPYRIGHT: (C)2004,JPO |
