| 摘要 |
PROBLEM TO BE SOLVED: To perform uniform etching and, in its turn, uniform cleaning inside a reaction tube by solving the conventional problem about the supply of an etching gas. SOLUTION: In order to set a state in which the discharge from a gas discharging pipe is stopped while a cleaning gas is supplied to the reaction tube from a gas introducing pipe, a first step of removing deposits adhering to the inside of the reaction tube by filling up the pipe with the cleaning gas is performed by stopping the discharge of a gas from the gas discharging pipe or adjusting the discharging amount of the gas to such a degree that the gas has no effect on the flow of the cleaning gas. After the first step, the internal wall of the reaction tube is cleaned by performing a cleaning step of removing the atmosphere filling inside the reaction tube from the gas discharging pipe at least one or more cycles as a second step. COPYRIGHT: (C)2004,JPO
|
