摘要 |
The present invention provides for an improved data collection system comprising a measurement device and a controller, wherein the controller provides at least one algorithm for data handling, storage and manipulation. The present invention further provides for an improved method of data handling, storage and manipulation comprising the steps of: measuring a first set of data using a measurement device coupled to a process reactor, producing a first set of reduced data using a peak extraction algorithm executed on a controller coupled to the measurement device, wherein the first set of reduced data comprises a data volume equal to or less than a data volume of the first set of data. In an alternate embodiment of the present invention a first reduced data set and a second reduced data set can be determined, compared and correlated with a state of the plasma processing system. The state of the plasma processing system can include an endpoint condition or a fault condition.
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