发明名称 Positive-working resist composition
摘要 A positive-working resist composition comprising: (A1) a resin containing a repeating unit represented by the specific formula, which increases the solubility in an alkali developing solution by the action of an acid, and (B) a compound capable of generating an acid upon irradiation with one of actinic rays and radiation.
申请公布号 US2004005512(A1) 申请公布日期 2004.01.08
申请号 US20030448041 申请日期 2003.05.30
申请人 FUJI PHOTO FILM CO., LTD. 发明人 MIZUTANI KAZUYOSHI;KANNA SHINICHI;SASAKI TOMOYA
分类号 G03F7/004;G03F7/039;(IPC1-7):G03F7/039 主分类号 G03F7/004
代理机构 代理人
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