发明名称 |
Positive-working resist composition |
摘要 |
A positive-working resist composition comprising: (A1) a resin containing a repeating unit represented by the specific formula, which increases the solubility in an alkali developing solution by the action of an acid, and (B) a compound capable of generating an acid upon irradiation with one of actinic rays and radiation.
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申请公布号 |
US2004005512(A1) |
申请公布日期 |
2004.01.08 |
申请号 |
US20030448041 |
申请日期 |
2003.05.30 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
MIZUTANI KAZUYOSHI;KANNA SHINICHI;SASAKI TOMOYA |
分类号 |
G03F7/004;G03F7/039;(IPC1-7):G03F7/039 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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