发明名称 |
LITHOGRAPHY APPARATUS, MANUFACTURING METHOD OF DEVICE, AND DEVICE MANUFACTURED THEREBY |
摘要 |
PROBLEM TO BE SOLVED: To correct the process dependency of a level sensor of at least two lithography projecting apparatus for each machine by calibrating the level sensor. SOLUTION: A calibration method comprises a step for measuring a second set of levelling data using a first lithography projecting apparatus for a reference substrate, a step for measuring a second set of levelling data using the first apparatus for a substrate processed following a selected process, a step for measuring a third set of levelling data using a second apparatus, a step for measuring a fourth set of levelling data using the second apparatus, and a step for calculating a set of parameters of level sensors corresponding to a difference of the level sensors between machines for the selected process. COPYRIGHT: (C)2004,JPO |
申请公布号 |
JP2004006892(A) |
申请公布日期 |
2004.01.08 |
申请号 |
JP20030151649 |
申请日期 |
2003.04.22 |
申请人 |
ASML NETHERLANDS BV |
发明人 |
QUEENS RENE MARINUS GERARDUS J;TEUNISSEN PAULUS ANTONIUS A |
分类号 |
G03F7/20;G03F7/207;G03F9/00;H01L21/027;(IPC1-7):H01L21/027 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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