发明名称 Procédé de fabrication d'un composant semiconducteur
摘要 1,176,119. Semi-conductor devices. COMPAGNIE GENERALE D'ELECTRICITE. 23 May, 1968 [24 May, 1967], No. 24780/68. Heading H1K. A method of increasing the breakdown voltage between the electrodes 11, 12 of a semiconductor element 13, where the electrodes are separated by a thin insulation 14, is to apply a thicker insulation 15 over and completely covering the outside surface of the thin insulation and the projecting rims 11a, 12a of the electrodes. The insulation 14 may be of ceramics or epoxy resin and the outer insulation 15, which may have a corrugated outer surface, Fig. 2, (not shown), may be of the same material as insulation 14 or of a polymerized elastomer. The outer surface of insulation 14 may be roughened prior to the application of insulation 15 to facilitate adherence.
申请公布号 CH474151(A) 申请公布日期 1969.06.15
申请号 CH19680006884 申请日期 1968.05.08
申请人 COMPAGNIE GENERALE D'ELECTRICITE 发明人 CHOFFART,PIERRE
分类号 H01L23/051;H01L23/16;H01L23/367;H01L23/58;(IPC1-7):H01L1/02 主分类号 H01L23/051
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