发明名称 |
WRITING OF PHOTO-INDUCED STRUCTURES |
摘要 |
<p>A method of writing a photo-induced structure into a photosensitive material substrate, the method comprising the steps of creating an interference pattern utilising at least two light beams, exposing the substrate to the interference pattern for photo-inducing material changes in the substrate, and creating an irregularity in the interference pattern by controlling a wavefront of at least one of the beams, for creating a functional defect in the photo-induced structure.</p> |
申请公布号 |
WO2004003611(A1) |
申请公布日期 |
2004.01.08 |
申请号 |
WO2003AU00823 |
申请日期 |
2003.06.27 |
申请人 |
AUSTRALIAN PHOTONICS PTY LTD;THE UNIVERSITY OF SYDNEY;SCEATS, MARK;STEPANOV, DMITRII, YU |
发明人 |
SCEATS, MARK;STEPANOV, DMITRII, YU |
分类号 |
G03F7/004;G02B5/18;G02B6/02;G02B6/122;G02B6/124;G02B6/13;G03F7/20;G11B7/00;(IPC1-7):G02B6/124;G11B7/006 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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