| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a halftone type phase shift mask blank or the like which has adjusted prescribed transmittance and phase shift quantity to light for exposure of a wavelength selected from a wavelength region of 140 to 200 nm, permits the inspection of the foreign substance defects of the halftone type phase shift mask blank and further permits the defect assurance as a mask blank. <P>SOLUTION: In the halftone type phase shift mask blank having phase shifter films, the phase shifter films have the prescribed transmittance and phase shift quantity to the light for exposure of the wavelength selected from the wavelength region of 140 to 200 nm, wherein the transmittance and phase shift quantity is adjusted by using the multilayered films where at least≥2 layers including an upper layer formed on the outermost surface side and a lower layer are laminated thereunder. The phase shifter films further have reflectivity to permit inspection with the inspection light used for the inspection of the foreign substance defects of the halftone type phase shift mask blank. <P>COPYRIGHT: (C)2004,JPO</p> |
