| 摘要 |
Silicon-containing polymers comprising recurring units of three components represented by the general formula (1) are novel wherein R<1>, R<2 >and R<3 >are hydrogen or C1-10 alkyl, R<4>, R<5 >and R<6 >are hydrogen, C1-20 alkyl or haloalkyl, or C6-20 aryl, R<7 >is C4-20 alkyl, n is 1 to 5, p, q and r are positive numbers. Resist compositions comprising the polymers are sensitive to high-energy radiation and have a high sensitivity and resolution at a wavelength of less than 300 nm and improved resistance to oxygen plasma etching.
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