发明名称 MEMBRANE AIR INLET PORT STRUCTURE OF CHEMICAL MECHANICAL POLISHING APPARATUS
摘要 PURPOSE: A membrane air inlet port structure of a CMP(Chemical Mechanical Polishing) apparatus is provided to be capable of preventing the increase of pressure at the air inlet port of a membrane part. CONSTITUTION: An air inlet port is used for supplying air to a membrane part of a CMP apparatus. At this time, a cone type nozzle(34) is installed at the end portion of the air inlet port for scattering air pressure. At the time, the air inlet port includes a guide layer for guiding the air flow to many directions in order to prevent the air pressure from directly influencing the lower portion of the membrane part. Preferably, a predetermined structure screw is inserted into the end portion of the air inlet port for guiding the air flow to not the vertical direction but the horizontal direction, wherein the screw has a plurality of holes at the lateral portion for scattering the air pressure.
申请公布号 KR20040001476(A) 申请公布日期 2004.01.07
申请号 KR20020036692 申请日期 2002.06.28
申请人 HYNIX SEMICONDUCTOR INC. 发明人 LEE, DEOK WON;LEE, SE YEONG
分类号 H01L21/304;(IPC1-7):H01L21/304 主分类号 H01L21/304
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