| 摘要 |
PURPOSE: An etching apparatus of a photo mask is provided to be capable of preventing the defect portion formed at an etch object mask from influencing the other portion of the etch object mask. CONSTITUTION: An etching apparatus of a photo mask is provided with an upper and lower electrode(50,10) for generating plasma by using electricity and an insulating cover plate(20) made of quartz for insulating the plasma. At this time, the insulating cover plate includes rectangular type installation groove portion(22) corresponding to the center portion of the lower electrode. The etching apparatus further includes an etch object mask(40) loaded into the installation groove portion of the insulating cover plate and a tray(30) having a loading groove portion for enclosing the lower and lateral portion of the etch object mask, installed at the installation groove portion of the insulating cover plate.
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