| 摘要 |
PURPOSE: A system using two part covers for protecting a reticle, its method, a gas-tight box and a loadlock are provided, to prevent a mask from being contaminated by airborne particles without deterioration of the quality of EUV light passing through the system. CONSTITUTION: The system(100) comprises a reticle(1); and a cover which is connected with the reticle for protecting the reticle and comprises a frame(2) and a detachable panel(3) moving to allow light to be accessed directly to the reticle during exposure process. Preferably, the system comprises further a robot gripper(4) moving the cover and the reticle. Also the system comprises a mask having a front face and a back face; and a detachable cover covering the front face of the mask, wherein the cover comprises a plane plate which has a first face toward the mask and a second face leaving the mask and has a size equal to the front face of the mask; a spacer which is projected from the first face of the plane plate, maintains the distance from the mask and the cover, and is connected with the plane plate; and a mask locator which is projected from the first face of the plane plate, seals the mask inside the cover and is connected with the plane plate.
|
