| 摘要 |
PURPOSE: A liquid pressure type CMP(Chemical Mechanical Polishing) carrier apparatus is provided to be capable of preventing the increase of pressure at a specific portion of a membrane part. CONSTITUTION: A liquid pressure type CMP carrier apparatus(20) is provided with a cylinder(24) stored with liquid(22) instead of air, installed near a membrane part and a piston inserted into the cylinder for pressing the liquid. Preferably, the liquid is made of one selected from a group consisting of deionized water, IPA, ethanol, and methanol. At this time, these kinds of liquids have a small specific gravity. At the time, the liquids are non-reactive to the membrane part and a wafer. Preferably, a spiral type cylinder or an air pressure type cylinder is used as the cylinder.
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