Method and tumbling apparatus with two oscillating movements

摘要

The method for polishing the surface of a part (2) with a polishing product (10) contained in a tank (1) consists of fixing the part to a support piece which holds it in contact with the polishing product. The support part is then given an oscillatory movement (A) so as to cause in the polishing product an induced circular movement which engenders its displacement in contact with the part. An Independent claim is included for a polishing device.