发明名称 |
LITHOGRAPHY APPARATUS, PREPARATION METHOD OF DEVICE AND DEVICE PREPARED BY THE METHOD |
摘要 |
PURPOSE: A lithography projection apparatus, a method for preparing a device and a device prepared by the method, a method for determining a substrate to be imaged previously and a substrate are provided, to improve the image performance of a lithography process by using a dual stage lithography apparatus. CONSTITUTION: The lithography projection apparatus comprises a light emission system which supplies a projection beam; a support structure which supports a patterning means patterning the projection beam according to a certain pattern; a first substrate holder(WT1) which holds a substrate(W1); a second substrate holder(WT2) which holds a substrate(W2); a projection system which projects the patterned projection beam on the target area of the substrate; and a means for controlling imaging to reduce the effect due to the difference of the two substrate holders when a second pattern is imaged on the substrate where a first pattern is imaged. |
申请公布号 |
KR20040002486(A) |
申请公布日期 |
2004.01.07 |
申请号 |
KR20030021581 |
申请日期 |
2003.04.07 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
ROSSING HARM ROELOF;VANDENBRINK MARINUS AART;GEORGE RICHARD ALEXANDER |
分类号 |
G03F7/20;H01L21/027;(IPC1-7):G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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