发明名称 COMPOSITION FOR FORMING INTERLAYER INSULATING FILM BY INK JET SYSTEM
摘要 PURPOSE: To provide a composition which satisfies various performances required as an interlayer insulating film, such as adhesion, surface hardness, transparency, heat-, light- and solvent resistances and is used for forming an interlayer insulating film by a low-cost ink jet system. CONSTITUTION: The composition comprises (A) a copolymer of (a1) an unsaturated carboxylic acid and/or an unsaturated carboxylic acid anhydride, (a2) an epoxy-containing unsaturated compound and (a3) other olefinic unsaturated compounds, (B) a 1,2-quinonediazide compound and (C) a solvent having >=180°C boiling point under ordinary pressure.
申请公布号 KR20040002492(A) 申请公布日期 2004.01.07
申请号 KR20030023575 申请日期 2003.04.15
申请人 JSR CORPORATION 发明人 MINOWA TAKAKI;NIWA KAZUAKI
分类号 G03F7/023;G02F1/1368;G03F7/032;G03F7/16;(IPC1-7):G03F7/023 主分类号 G03F7/023
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