| 摘要 |
PURPOSE: A photosensitive polymer containing an adamantyl alkyl vinyl ether copolymer and a resist composition containing the polymer are provided, to improve resistance against dry etching and adhesive strength to an under substrate. CONSTITUTION: The photosensitive polymer comprises the copolymer represented by the formula 1, 2 or 3, wherein x is an integer of 1-4; R1 is H or CH3; R2 is an acid-labile hydrocarbon group of C4-C20; R3 is H, OH, COOH, a halogen atom, a nitrile group, an alkyl group, an alkoxy group, a sulfonyl group, or an acid-labile ester group of C4-C20 (in the formula 3, at least one between R2 and R3 contains an acid-labile group); and p/(p+q+r) = 0.1-0.4, q/(p+q+r) = 0.1-0.5, r/(p+q+r) = 0.1-0.4, p/(p+q+s) = 0.1-0.4, q/(p+q+s) = 0.3-0.5, s/(p+q+s) = 0.2-0.5, p/(p+q+r+s) = 0.1-0.3, q/(p+q+r+s) = 0.2-0.5, r/(p+q+r+s) = 0.1-0.4, and s/(p+q+r+s) = 0.1-0.3. The resist composition comprises the photosensitive polymer; a photoacid generator; and optionally an organic base.
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