Electrostatic chuck

摘要

Electrostatic holding element has a dielectric part with a thickness of less than 0.5 mm and having a structured surface. The holding element is made from a material having a specific electrical resistance of more than 1013 OMEGAcm at 20degrees C and a heat expansion coefficient of less than 10-7/K in the temperature range of 0-50degrees C. Preferred Features: The material of the holding element is an alkali/alkaline earth-alumino silicate, preferably LiAlSiO4, LiAlSi2O6 or Zn0.5AlSi2O6, in a SiO2 matrix. The structured surface has protrusions with recesses between them having a depth of 0.5-0.001 mm.