发明名称 PROJECTION ALIGNER AND ALIGNMENT SYSTEM
摘要 PURPOSE: To provide a projection aligner which permits exact alignment. CONSTITUTION: When a mask mark 90 is illuminated by a UV light source 60 of a UV illuminator 6 in the state that a printed wiring board 76 is placed on a transfer stage 70, the image of the mask mark 90 is reflected by a UV reflecting surface mirror 10 through a half mirror 11, and is imaged to a charge coupled device(CCD) 30 further through a beam splitter 34 and an imaging lens 32 and the central coordinates thereof are measured by an image recognizer 2. Next, substrate marks 91 on the board 76 are illuminated by an IR ray source 50 of an IR illuminator 5 and the image thereof is formed on a CCD 40 through the mirror 10, the half mirror 11, the beam splitter 34, a reflecting mirror 43, an imaging lens 42, and a beam splitter 52. The alignment is performed by controlling a transfer mechanism 81 so as to match the central coordinates of the substrate marks 91 on the CCD 40 for IR rays to rotationally move the transfer stage 70 in X-Y directions and a Θ direction.
申请公布号 KR20040002495(A) 申请公布日期 2004.01.07
申请号 KR20030024336 申请日期 2003.04.17
申请人 ADTEC ENGINEERING CO., LTD. 发明人 HIRABAYASHI YOUICHI;MATSUMOTO NORIYOSHI
分类号 G01B11/00;G03F7/20;G03F9/00;H01L21/027;(IPC1-7):G03F7/20 主分类号 G01B11/00
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