VAPOR DEPOSITION APPARATUS

摘要

PURPOSE: To provide a vapor deposition apparatus of excellent practicability for automatically correcting a mask and a substrate at an adequate overlapping position and setting them with high accuracy even in a configuration having a fixed part in a vacuum tank or a rotating mechanism to rotate the fixed part. CONSTITUTION: This vapor deposition apparatus has a camera unit 11 to visually recognize an index to discriminate an adequate overlapping position of a mask 2 and a substrate 3, and a correction control unit to control the movement of a fixed part 4 to fix or support the mask 2 with respect to the substrate 3 held by a substrate holding mechanism 9 by operating a correction drive mechanism 8 by the discrimination based on an image of the camera unit 11 and correct the fixed part to the adequate overlapping position.