RETICLE FOR FABRICATING SEMICONDUCTOR DEVICE AND METHOD FOR SENSING POSITION OF THE SAME

摘要

PURPOSE: A reticle for fabricating a semiconductor device and a method for sensing a position of the same are provided to detect an inclined state of the reticle by comparing the reference distance with the distance sensed by the first and the second sensor. CONSTITUTION: A reticle for fabricating a semiconductor device includes a glass(4) and a chrome pattern(6). The glass(4) has a shape of a flat plate. The chrome pattern(6) is formed on one of an upper surface and a lower surface of the glass(4). A reflective layer(8) is formed on one of side portions of the glass(4). The reflective layer(8) has the predetermined thickness. A method for sensing a position of the reticle includes a reflective layer forming process, a sensing process for sensing an upper portion and a lower portion of the reflective layer(8) by using the first and the second sensor, and a calculating process for calculating the distance between the first and the second sensor and the upper portion and the lower portion of the reflective layer(8), and a position detection process for detecting the position of a reticle(2) by using the calculated distance.