METHOD FOR FABRICATING SEMICONDUCTOR DEVICE

摘要

PURPOSE: A method for fabricating a semiconductor device is provided to improve the characteristic and reliability through a landing plug poly formation process by forming a sub pattern in the layout of a landing plug poly mask and by completely opening an active region in an etch process using the landing plug poly mask. CONSTITUTION: The sub pattern(500) is formed in the active region of the light interception region(300) of a landing plug poly mask for a bitline so that the contact area of the active region and the bitline is increased in a contact process.