POSITIVE RESIST COMPOSITION

摘要

PURPOSE: To provide an excellent positive resist composition excellent in line edge roughness and giving a pattern prevented from falling, particularly a fine pattern free of falling even when focus or exposure is varied. CONSTITUTION: The positive resist composition comprises (A) a compound which generates an acid upon irradiation with an actinic ray or a radiation, (B) a resin which is alkali-insoluble or slightly alkali-soluble and becomes alkali- soluble under the action of an acid and (D) a chain compound having three or more hydroxyl groups or substituted hydroxyl groups.