| 摘要 |
PURPOSE: To provide a scanning aligner for easily reproducing a high resolution and a projection image on a large screen for a mask deformed by its own weight in the scanning aligner for projecting mask patterns to a substrate, and to provide a method for manufacturing a device using the aligner. CONSTITUTION: The scanning aligner, comprising an arc illumination optical system 7, a projection optical system 4 for projecting a pattern within a mask 1 illuminated by the illumination optical system to the substrate 5, a mask stage 2 for scanning the mask, and a substrate stage 6 for making the substrate scan, scans the mask stage and the substrate stage in synchronizing each other. To position the mask pattern image and the substrate to a predetermined positional relation, the scanning aligner has a mask supporting means for supporting a peripheral part of the mask, and a mask stage inclination means for setting the pattern within the illumination region of the mask deformed by its own weight resulted from the peripheral support within a focal surface of the body surface side of the projection optical system. |
