发明名称 Anodizing system with a coating thickness monitor and an anodized product
摘要 An anodizing system for forming a anodized coating on at least a portion of a substrate thereby creating an anodized substrate is disclosed. The anodizing system includes a bath, a coating thickness monitor, at least one probe and at least one controller. The coating thickness monitor includes at least one radiation source directed at at least a portion of the anodized substrate; at least one probe for capturing at least a portion of the radiation reflected and refracted by the anodized coating on the anodized substrate, the captured radiation being at least a portion of the radiation directed the anodized substrate from the radiation source; and at least one detector in communication with the at least one probe, the at least one detector capable of processing the captured radiation to allow a determination of at least the thickness.
申请公布号 US6674533(B2) 申请公布日期 2004.01.06
申请号 US20000742595 申请日期 2000.12.21
申请人 发明人
分类号 C25D11/02;C25D11/04;C25D21/12;G03C1/492;(IPC1-7):G01B11/02;G01B9/02 主分类号 C25D11/02
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