发明名称 |
SEMICONDUCTOR MEMORY DEVICE AND FABRICATING METHOD THEREFOR |
摘要 |
PURPOSE: A semiconductor memory device and a fabricating method therefor are provided to arrange a storage electrode on a plane by forming a wiring pad between a contact plug and a storage electrode. CONSTITUTION: A semiconductor memory device includes an interlayer dielectric(212), a storage node contact plug(216), a material layer(220), a wiring pad(218), and a storage electrode(222). The interlayer dielectric(212) having a plurality of storage node contact holes is formed on a semiconductor substrate(210). The storage node contact plug(216) is buried into the storage node contact hole. The material layer(220) has a wiring pad hole to expose the storage node contact plug(216). The wiring pad(218) is buried into the wiring pad hole. The storage electrode(222) is connected to the wiring pad(218).
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申请公布号 |
KR20040000068(A) |
申请公布日期 |
2004.01.03 |
申请号 |
KR20020034996 |
申请日期 |
2002.06.21 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
CHO, CHANG HYEON;JUNG, TAE YEONG;KIM, SANG BEOM;LEE, GYU HYEON;PARK, YANG GEUN |
分类号 |
H01L21/28;H01L21/02;H01L21/768;H01L21/822;H01L21/8242;H01L27/04;H01L27/108;(IPC1-7):H01L27/108 |
主分类号 |
H01L21/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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