发明名称 SEMICONDUCTOR MEMORY DEVICE AND FABRICATING METHOD THEREFOR
摘要 PURPOSE: A semiconductor memory device and a fabricating method therefor are provided to arrange a storage electrode on a plane by forming a wiring pad between a contact plug and a storage electrode. CONSTITUTION: A semiconductor memory device includes an interlayer dielectric(212), a storage node contact plug(216), a material layer(220), a wiring pad(218), and a storage electrode(222). The interlayer dielectric(212) having a plurality of storage node contact holes is formed on a semiconductor substrate(210). The storage node contact plug(216) is buried into the storage node contact hole. The material layer(220) has a wiring pad hole to expose the storage node contact plug(216). The wiring pad(218) is buried into the wiring pad hole. The storage electrode(222) is connected to the wiring pad(218).
申请公布号 KR20040000068(A) 申请公布日期 2004.01.03
申请号 KR20020034996 申请日期 2002.06.21
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 CHO, CHANG HYEON;JUNG, TAE YEONG;KIM, SANG BEOM;LEE, GYU HYEON;PARK, YANG GEUN
分类号 H01L21/28;H01L21/02;H01L21/768;H01L21/822;H01L21/8242;H01L27/04;H01L27/108;(IPC1-7):H01L27/108 主分类号 H01L21/28
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