CLEANING SOLUTION AND METHOD FOR CLEANING CERAMIC COMPONENTS BY USING THE SAME

摘要

PURPOSE: A cleaning solution and a method for cleaning ceramic components by using the same are provided to clean effectively the ceramic components including byproducts generated from a plasma process by changing ingredients of the cleaning solution. CONSTITUTION: A cleaning solution includes fluoride salt of 5 to 10 weight percent, organic acid of 10 to 20 weight percent, organic solvent of 30 to 50 weight percent, and water of 20 to 50 weight percent. The fluoride salt includes ammonium fluoride. The organic acid includes acetic acid. The organic solvent includes dimethyl acetamide. The cleaning solution further includes (NH3OH)2SO4 of 0 to 10 weight percent on the basis of the cleaning solution of 100 weight percent. A method for cleaning ceramic components by using the cleaning solution includes a soaking process(S12) for soaking the ceramic components into the cleaning solution, a rinsing process(S14) for rinsing the ceramic components, and a heat treatment process(S16) for heating the ceramic components.