| 发明名称 |
EXTREME ULTRAVIOLET MASK WITH IMPROVED ABSORBER |
| 摘要 |
<p>The present invention discloses an EUV mask having an improved absorber layer with a certain thickness that is formed from a metal and a nonmetal in which the ratio of the metal to the nonmetal changes through the thickness of the improved absorber layer and a method of forming such an EUV mask.</p> |
| 申请公布号 |
EP1373978(A2) |
申请公布日期 |
2004.01.02 |
| 申请号 |
EP20020721056 |
申请日期 |
2002.02.14 |
| 申请人 |
INTEL CORPORATION |
发明人 |
ZHANG, GUOJING;YAN, PEI-YANG |
| 分类号 |
B82Y10/00;G03F1/22;G03F1/24;G03F1/54;(IPC1-7):G03F1/14;G03F1/08 |
主分类号 |
B82Y10/00 |
| 代理机构 |
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| 主权项 |
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