发明名称 |
MASCHERA A SFASAMENTO A VORTICE PER LITOGRAFIA OTTICA. |
摘要 |
A photolithography method and apparatus for producing minima of light intensity corresponding to a point in a phase shift mask is described. The phase shift in the light produced by the mask varies in a spiral fashion around the point so that the phase shift measured along lines drawn across the surface of the mask which pass through the point have a 180° jump at the point, and lines passing around the point have no jumps between 130° and 230°, and most preferably no jumps between 100° and 260°. |
申请公布号 |
ITTO20030494(A1) |
申请公布日期 |
2004.01.02 |
申请号 |
IT2003TO00494 |
申请日期 |
2003.06.30 |
申请人 |
DAI NIPPON PRINTING CO., LTD.;LEVENSON MARC DAVID |
发明人 |
LEVENSON MARC DAVID |
分类号 |
G03F7/20;B41F;G03F1/00;G03F1/28;G03F1/34 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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