发明名称 |
OPTICALLY ACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION |
摘要 |
<p>A photoactive compound is used in combination with a photosensitizer, represented by the following formula (1): A-Ä(J)m-(X-Pro)Ün wherein A represents a hydrophobic unit comprising at least one kind of hydrophobic groups selected from a hydrocarbon group and a heterocyclic group, J represents a connecting group, X-Pro represents a hydrophilic group protected by a protective group Pro which is removable by light exposure, m represents 0 or 1, and n represents an integer of not less than 1. <??>The protective group Pro may be removable by light exposure in association with the photosensitizer (especially, a photo acid generator), or may be a hydrophobic protective group. The hydrophilic group may be a hydroxyl group or a carboxyl group. The photoactive compound has high sensitivity to a light source of short wavelength beams, for resist application, therefore, the photoactive compound is advantageously used for forming a pattern with high resolution.</p> |
申请公布号 |
EP1375463(A1) |
申请公布日期 |
2004.01.02 |
申请号 |
EP20020713248 |
申请日期 |
2002.03.29 |
申请人 |
KANSAI RESEARCH INSTITUTE, INC. |
发明人 |
HANABATA, MAKOTO;SATO, MASAHIRO;KATAYAMA, JUNKO;KITAJIMA, SATSUKI;NIWA, ATSUSHI |
分类号 |
C07C43/303;C07C43/313;C07C43/315;C07C69/773;C07C69/92;C07C69/96;C07C271/58;C07C317/22;G03F7/004;G03F7/039;(IPC1-7):C07C43/205;C07C69/734;C07C69/76;C07C43/225;C07C43/215;C07C69/618;C07C69/65;C07C69/82;H01L21/30;C08L101/00;C08K5/00;C07F7/08;C07C235/56;C07C69/94 |
主分类号 |
C07C43/303 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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