发明名称 PROCESS FOR PRODUCTION OF PARTIALLY PROTECTED POLY(HYDROXYSTYRENE)S
摘要 <p>A process for production of poly(hydroxystyrene)s whose phenolic hydroxyl groups are partially protected by acid-decomposable or -eliminable groups is provided, by which the degree of deblocking of the phenolic hydroxyl groups can be easily and highly accurately controlled without fail. Namely, a process for production of a polymer containing in the molecule repeating units of the general formula (IA) and those of the general formula (IB), characterized by comprising the step of adding an acid to a polymer (B) containing in the molecule repeating units of the general formula (II) in an organic solvent with the molar ratio of the acid to the OR3 group being 0.0001 equivalent or above but below 0.05 equivalent, and reacting the polymer with the acid. (IA) (IB) (II) ÄIn the general formulae, R1 is hydrogen or methyl; R2 is C1-6 alkyl; R3 is an acid-decomposable or -eliminable group; R4 is hydrogen or a group derived from R3 by decomposition with acid; and p is 0, 1, or 2, with the proviso that the IB/IA molar ratio ranges 98/2 to 30/70.Ü <CHEM></p>
申请公布号 EP1375535(A1) 申请公布日期 2004.01.02
申请号 EP20020716385 申请日期 2002.01.25
申请人 NIPPON SODA CO., LTD. 发明人 MURAMOTO, HIROO;KIMIZUKA, SHINICHI
分类号 C08F8/00;C08F212/14;(IPC1-7):C08F212/14;C08F8/12 主分类号 C08F8/00
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