发明名称 |
Full-contact type exposure device |
摘要 |
<p>The invention provides a full-contact type exposure device that allows high adherence of a photo mask with a board. Upon completion of prescribed processing such as positioning, a controller 99 controls a moving mechanism 21 to move a platen 20 upward, thereby moving the photo mask 1 and a board 2 closer, and to stop at a position where a sealed space is formed between the two. At the same time a controller 99 starts vacuuming by controlling a vacuum pump 51. By this vacuum the pressure in the space between the photo mask 1 and board 2 becomes negative, and the photo mask 1 bends downward with its center area sagging and contacting the board 2. The controller 99 controls a cam drive mechanism 31 to rotate cams 30 while vacuuming, allowing the photo mask 1 to gradually make contact with the board 2 from the center area to its periphery while pushing out the air gradually from the center to the periphery, thereby completing full contact with the board 2.</p> |
申请公布号 |
EP1376235(A2) |
申请公布日期 |
2004.01.02 |
申请号 |
EP20030013373 |
申请日期 |
2003.06.17 |
申请人 |
ADTEC ENGINEERING CO., LTD. |
发明人 |
TAJIMA, TSUNESOU;MOMII, ISAO |
分类号 |
G03F7/20;G03B27/20;H01L21/027;(IPC1-7):G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|