发明名称 |
A REACTOR FOR PLASMA ASSISTED TREATMENT OF GASEOUS |
摘要 |
A plasma reactor ( 11 ) of the silent discharge or dielectric barrier type for treatment of a gaseous medium is provided with a layer of material ( 34 ) positioned to present a surface extending along at least part of the length of the gas flow path. Particulates or selected species are entrapped on the surface. A preferred electrode arrangement provides surface discharge in the plasma at the surface of the layer of material. |
申请公布号 |
EP1372842(A1) |
申请公布日期 |
2004.01.02 |
申请号 |
EP20020718282 |
申请日期 |
2002.03.15 |
申请人 |
ACCENTUS PLC |
发明人 |
CARLOW, JOHN SYDNEY;NG, KA LOK;SHAWCROSS, JAMES TIMOTHY |
分类号 |
F02M27/04;B01D53/56;B01D53/62;B01D53/72;B01D53/74;B01D53/92;B01J12/00;B01J19/08;B01J19/24;C01B3/34;F01N3/08 |
主分类号 |
F02M27/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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