发明名称 A REACTOR FOR PLASMA ASSISTED TREATMENT OF GASEOUS
摘要 A plasma reactor ( 11 ) of the silent discharge or dielectric barrier type for treatment of a gaseous medium is provided with a layer of material ( 34 ) positioned to present a surface extending along at least part of the length of the gas flow path. Particulates or selected species are entrapped on the surface. A preferred electrode arrangement provides surface discharge in the plasma at the surface of the layer of material.
申请公布号 EP1372842(A1) 申请公布日期 2004.01.02
申请号 EP20020718282 申请日期 2002.03.15
申请人 ACCENTUS PLC 发明人 CARLOW, JOHN SYDNEY;NG, KA LOK;SHAWCROSS, JAMES TIMOTHY
分类号 F02M27/04;B01D53/56;B01D53/62;B01D53/72;B01D53/74;B01D53/92;B01J12/00;B01J19/08;B01J19/24;C01B3/34;F01N3/08 主分类号 F02M27/04
代理机构 代理人
主权项
地址