发明名称 Plasma focus high energy photon source with blast shield
摘要 A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at voltages high enough to create electrical discharges between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the active gas. A blast shield positioned just beyond the location of the high density pinch provides a physical barrier which confines the pinch limiting its axial elongation. A small port is provided in the blast shield that permits the radiation but not the plasma to pass through the shield. In a preferred embodiment a surface of the shield facing the plasma is dome-shaped. <IMAGE>
申请公布号 EP1037510(A3) 申请公布日期 2004.01.02
申请号 EP20000105278 申请日期 2000.03.14
申请人 CYMER, INC. 发明人 PARTLO, WILLIAM N.;FOMENKOV, IGOR V.;BIRX, DANIEL L.
分类号 G03F7/20;H05G2/00 主分类号 G03F7/20
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