发明名称 BIPOLAR PLASMA SOURCE, PLASMA SHEET SOURCE, AND EFFUSION CELL UTILIZING A BIPOLAR PLASMA SOURCE AND METHOD OF GENERATING A PLASMA WITH ONE OF SAID SOURCES
摘要 <p>A plasma source includes a structure made up of two hollow cathode shapes connected to a bipolar AC power supply. The bipolar power supply alternately drives one hollow cathode to a negative voltage while the opposite hollow cathode is driven to a positive voltage. As one of the two hollow cathode shapes is driven negative, the hollow cathode discharge forms within the corresponding cavity. The other cathode then forms an anode, causing electrons to escape the plasma and travel to the other side, completing the electric circuit. The plasma generator thus formed may be used as a heat source for an effusion cell to form a plasma from a reactant gas, or to increase the reactivity of gas situated between a vacuum deposition source and a substrate to be coated.</p>
申请公布号 EP1372897(A2) 申请公布日期 2004.01.02
申请号 EP20020719127 申请日期 2002.03.27
申请人 CPFILMS, INC. 发明人 MASCHWITZ, PETER;LI, JAIME
分类号 H05H1/24;C23C14/24;C23C14/32;H01J37/32;(IPC1-7):B23K10/00 主分类号 H05H1/24
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